Compared with the Korea semiconductor industry first starts using EUV lithography technology, the related industrial memory and wafer genetic time is relatively backward. However, Korean media "Business Korea" reported, recently semiconductor enterprises in Taiwan, China, to step up investment EUV lithography, further expand the competitive advantage.
At present, Micron Technologies in Taiwan's largest foreign business stores in Taiwan, in addition to deciding to install ASML latest exposure equipment this year, NXE: 3600D, Micron Technology also plans to install the same EUV lithography equipment in the DRAM plant in Taiwan. On behalf of Micron Technology, the first EUV technology DRAM will be produced in Taiwan, China and continue to increase investment.
In addition to Micron Technology, the world's DRAM industry ranked fourth large South Asia Technology announced in April that investment of 300 billion yuan in New Taiwan coins in New Taiwan, the DRAM production line including EUV lithography equipment, is expected to be 2024 Operation.
The influence of the EUV lithography equipment industry in the wafer founder TSMC also increases. From the second quarter of this year, 7 nanometers and more advanced process technology using EUV lithography accumulate 49% of the company's general campaign. It is purchasing more EUV lithography equipment from exposure equipment manufacturers, increasing R & D investment. It includes TSMC to produce EUV masks to enhance yield and process efficiency.
South Korea Samsung is the world's first semiconductor company that adopts EUV lithography technology, in 2019, the first mass production, today's large-scale development EUV technology also added Micron Technology, TSMC and other China Taiwan semiconductor enterprises. South Korea market experts pointed out that infrastructure continued to expand, and it is expected to bring more powerful competitive advantages in China's Taiwan.
China's Taiwan area semiconductor industry strengthens layout EUV technology, causing South Korea Samsung alert
Feb
02
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