According to the Korean media, ASML Financial News said that in the EUV High NA business, the company received additional orders from TWINSCAN EXE: 5200. All current EUV customers have placed orders for the next generation of semiconductor equipment "High NA", including Samsung and SK Hynix.

It is reported that the High NA EUV device is a device that increases the number of lens openings (NA) representing the light collection capacity from 0.33 to 0.55. Compared with existing EUV devices, High NA EUV devices can draw more subtle semiconductor circuits. Therefore, it is widely believed in the industry that High NA equipment will play a key role, even a necessary condition, in order to realize the 2nm process. Intel and TSMC have previously announced that they have ordered "High NA" EUV devices. With the entry of Samsung Electronics and SK Hynix, the competition for 2nm process technology will become more intense.

According to Korean equipment manufacturers, the order price of cash EUV lithography machine is 200~300 billion won (about 1~1.6 billion yuan), while the quotation of high NA EUV lithography machine doubled to 500 billion won (about 2.6 billion yuan).

Peter Wennenk, CEO and President of ASML, said: "Due to many global macroeconomic problems, including inflation, falling consumer confidence index, and the risk of economic recession, there is uncertainty in the market. Although we perceive different demand changes in different markets, the overall demand for ASML systems is still strong," and said "In this case, the booking sales in the third quarter were about 8.9 billion euros, of which the sales of EUV equipment such as High NA system reached 3.8 billion euros."

However, according to Korean media reports, Samsung and SK Hynix said when introducing High NA EUV equipment: "This is something that cannot be officially disclosed."