It is reported that the research team led by Riedo, a professor of chemical and biomolecular engineering at the University of New York University's Tanton School of Engineering, who demonstrated that lithography using probes heated to temperatures above 100 degrees Celsius is superior to two-dimensional semiconductors (eg MoS2) is less expensive and is expected to be a replacement for today's electron beam lithography.
New lithography process proven to have a major impact on the development of nanochips
Feb
02
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The industry is constantly refreshing the record of nanochips, which will undoubtedly bring us more possibilities in future computing. To this end, researchers from all over the world are constantly working hard. Recently, an international research team said in the report that it has made breakthroughs in the manufacture of nanochips, or will have a major impact on the production of nanochips and all nanotechnology laboratories around the world.
It is reported that the research team led by Riedo, a professor of chemical and biomolecular engineering at the University of New York University's Tanton School of Engineering, who demonstrated that lithography using probes heated to temperatures above 100 degrees Celsius is superior to two-dimensional semiconductors (eg MoS2) is less expensive and is expected to be a replacement for today's electron beam lithography.
It is reported that the research team led by Riedo, a professor of chemical and biomolecular engineering at the University of New York University's Tanton School of Engineering, who demonstrated that lithography using probes heated to temperatures above 100 degrees Celsius is superior to two-dimensional semiconductors (eg MoS2) is less expensive and is expected to be a replacement for today's electron beam lithography.